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Optimizing Calibration Process and Reducing Measurement Uncertainties in Wafer-Level mmWave Range Characterization
Wafer-level measurements in the millimeter-wave (mmWave) frequency range are essential for the precise characterization of high-frequency semiconductor devices and circuits. However, the increasing complexity of mmWave measurements introduce significant challenges in maintaining calibration accuracy and minimizing measurement errors. This presentation discusses advanced on-wafer RF calibration techniques, specifically targeting error minimization in the mmWave range. Key areas of focus include the systematic analysis and optimization of calibration standards, probe positioning, and mitigating parasitic effects through refined calibration procedures. Furthermore, we discuss probe-to-pad contact repeatability, and the impact of environmental variations, including temperature and on measurement accuracy.