AI-Driven Nano-Robotic RF Probe Station for Automated On-Wafer Characterization

We present a fully automated on-wafer RF measurement platform that combines nano-robotics with AI-assisted computer vision to achieve sub-micron probe alignment and high repeatability. The system leverages pattern recognition and real-time image analysis to optimize probe positioning and detect contact with minimal user intervention. Integrated with LabVIEW, the station performs full SOLT calibrations on standard substrates, significantly reducing residual errors compared to manual methods. Experimental results up to 50GHz demonstrate improvements in accuracy, reproducibility, and equipment safety. This approach addresses critical challenges in RF metrology, offering a robust solution for characterizing advanced micro- and nanoelectronic devices.