Back to IMS Schedule
Mon 16 Jun | 08:00 - 17:20
310/311
Challenges and Opportunities in On-Wafer Measurements at mm-Wave Frequencies for Future Applications
Gia Ngoc Phung, Abhijeet Kanitkar
PTB, FBH
Future wireless systems operating beyond 100GHz will enable a wide range of applications such as high data-rate communications, radar sensing and imaging. Such wireless systems are becoming a reality given the rapid increase in the development of RF devices at upper mm-wave and sub-THz frequency range. Accurate on-wafer measurements play an important role in the development of many established and emerging industrial applications. It is key that the performance of the fabricated planar RF circuits must be characterized by performing on-wafer measurements for quality assurance or during product development as a feedback to the design process. However, despite the significant progress made over the last decade in improving the accuracy of on-wafer measurements, several challenges remain to be overcome, particularly as frequencies increase. One of the most challenging aspects of on-wafer measurements is the presence of probe parasitics, multimode propagation and neighborhood effects. These effects occur both in active and passive devices, which are the key components of RF systems. This workshop will review the challenges and opportunities of on-wafer measurements and present fundamental aspects of on-wafer measurements, such as techniques to minimize calibration and measurement errors in the mm-wave range, the on-wafer traceability path, and techniques to improve on-wafer measurement accuracy. The workshop will also emphasize on-wafer calibration and automation for active device characterization and will address the importance of on-wafer measurements from IC designer’s perspective. During this interactive full-day workshop, ten experts from around the world will share their experience and guide you through various aspects of on-wafer measurements. The speakers come from a variety of backgrounds: National Metrology Institutes (NMIs) from the USA, Europe and Asia, instrument manufacturers, industry and academia. The aim of this workshop is therefore to provide an overview of these current research areas and to present future directions in the field of on-wafer measurements.
08:00 - 17:20
WMF-1 On-Wafer Calibrations and Material Measurements
Nathan Orloff
NIST
08:00 - 17:20
WMF-2 Measurement Accuracy Improvement in On-Wafer Measurement by RF Signal Detection Technique
Ryo Sakamaki
AIST
08:00 - 17:20
WMF-3 Transferring On-Wafer Traceability to Industrial Lumped-Element Calibrations
Uwe Arz
PTB
08:00 - 17:20
WMF-4 Optimizing Calibration Process and Reducing Measurement Uncertainties in Wafer-Level mm-Wave Range Characterization
Andrej Rumiantsev
MPI
08:00 - 17:20
WMF-5 Broadband Differential On-Wafer Measurements: Challenges in De-Embedding, Drive Control and Related Aspects
Jon Martens
Anritsu
08:00 - 17:20
WMF-6 On-Wafer 4-Port Measurements from 70kHz to 220GHz in a Single Sweep
James Hwang
Cornell Univ.
08:00 - 17:20
WMF-7 On-Wafer Characterization of Sub-THz InP HBTs: Importance of Choosing the Proper Error Correction Algorithm
Abhijeet Kanitkar
FBH
08:00 - 17:20
WMF-8 Approaches to Carry Out Well-Documented Measurements for Active Devices Using Varying Calibration Methodologies
James Hibbert
FormFactor
08:00 - 17:20
WMF-9 Addressing SiGe HBT Measurement Challenges Through the 16-Error-Term Calibration Method
Tarek Bouzar
IMS-Bordeaux
08:00 - 17:20
WMF-10 mm-Wave On-Wafer Measurements from a CMOS IC Designer’s Perspective
Shuhei Amakawa
Hiroshima Univ.